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File name:

1-003_VarMan_Leti-WhitePaper.pdf

Publication Date:

Apr 23, 2018

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2.27 MB

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During the last four decades, the global semiconductor industry has been prospering successfully on the planar CMOS process. As the technology keeps scaling down into the nanometer area, manufacturing has become a great challenge under device-to-device variations. Variability severely affects the electrical characteristics of the transistors, and then the integrated circuit performances and then its functionality.